000			00767nam a22002177a 4500
005			20251003124350.0
008			251003b |||||||| |||| 00| 0 eng d
020			_a0819451436 _qpbk.
041			_aeng
082			_a621.381531 _bKIM
100			_aKimmel, Kurt R. ; Staud, Wolfgang
245			_a23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa _c/ edited by Kurt R. Kimmel, Wolfgang Staud
250			_a1st ed.
260			_aBellingham _bSpie _cc2003
300			_axix, 700 p. _b: ill. _c; 29 cm.
490			_aProceedings of SPIE--the International Society for Optical Engineering _vv. 5256
504			_aBib and Ref
650			_aIntegrated Circuits Masks
650			_aMicrolithography
942			_cREF
999			_c590424 _d590424