| 000 | 00733nam a22002177a 4500 | ||
|---|---|---|---|
| 005 | 20251003120141.0 | ||
| 008 | 251003b |||||||| |||| 00| 0 eng d | ||
| 020 |
_a0819453692 _qpbk. |
||
| 041 | _aeng | ||
| 082 |
_a621.381531 _bTAN |
||
| 100 | _aTanabe, Hiroyoshi | ||
| 245 |
_aPhotomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan _c/ edited by Hiroyoshi Tanabe |
||
| 250 | _a1st ed. | ||
| 260 |
_aBellingham _bSpie _cc2004 |
||
| 300 |
_axiii, 990 p. _b: ill. _c; 28 cm. |
||
| 490 |
_aProceedings of SPIE--the International Society for Optical Engineering _vv. 5446 |
||
| 504 | _aBib and Ref | ||
| 650 | _aIntegrated Circuits Masks | ||
| 650 | _aMicrolithography | ||
| 942 | _cREF | ||
| 999 |
_c590421 _d590421 |
||