| 000 | 00717nam a2200229Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2003##################000#0#eng## | ||
| 020 | _a9781402075438 | ||
| 022 | _a2003054987 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.38152 BAR | ||
| 100 | _aBarnat, Edward V | ||
| 245 |
_aPulsed and pulsed bias sputtering : principles and applications _cby Edward V. Barnat, Toh-Ming Lu |
||
| 260 |
_aBoston _bKluwer Academic _c2003 |
||
| 300 | _ax, 155 p. : ill. ; 24 cm | ||
| 500 | _aIncludes bibliographical references and index | ||
| 650 | _aCathode sputtering (Plating process) | ||
| 650 | _aThin films | ||
| 700 | _aLu, T. -M | ||
| 990 | _a153db06dac10000c0dbc650cc12e2e02 | ||
| 991 | _a269166 | ||
| 999 |
_c47419 _d47419 |
||