| 000 | 01064nam a2200265Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2008##################000#0#eng## | ||
| 020 | _a9780819471093 | ||
| 022 | _a2010287642 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381531 LEV | ||
| 245 |
_aOptical microlithography XXI : 26-29 February 2008, San Jose, California, USA _cHarry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) |
||
| 260 |
_aBellingham, WA _bSPIE _cc2008 |
||
| 300 | _a3 v. : ill. (some col. ) ; 28 cm | ||
| 500 | _aIncludes bibliographical references and author index | ||
| 650 | _aIntegrated circuits - Masks - Congresses | ||
| 650 | _aManufacturing processes - Congresses | ||
| 650 | _aMicrolithography - Congresses | ||
| 650 | _aX-ray lithography - Congresses | ||
| 700 | _aDusa, Mircea V | ||
| 700 | _aLevinson, Harry J | ||
| 710 | _aInternational SEMATECH, Society of Photo-optical Instrumentation Engineers | ||
| 990 | _ad979861fac10000c0ceee81bd8371bf6 | ||
| 991 | _a367755 | ||
| 999 |
_c383849 _d383849 |
||