| 000 | 00647nam a2200205Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2000##################000#0#eng## | ||
| 020 | _a9780819436177 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a686.2325 HOU | ||
| 100 | _aHoulihan, Francis M | ||
| 245 |
_aAdvances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA _cHoulihan, Francis M |
||
| 260 |
_aBellingham, WA _bSPIE _c2000 |
||
| 300 | _axvii, 618 p. : ill. ; 29 cm | ||
| 500 | _aIncludes index | ||
| 650 | _aMicrolithography | ||
| 650 | _aPhotoresists | ||
| 990 | _ab575499eac10000c58b6595203763be0 | ||
| 991 | _a348429 | ||
| 999 |
_c363610 _d363610 |
||