| 000 | 01079nam a2200229Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2002##################000#0#eng## | ||
| 020 | _a9780819444363 | ||
| 022 | _a2003268664 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.3815 FED | ||
| 245 |
_aAdvances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA _cTheodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH |
||
| 260 |
_aBellingham, Wash _bSPIE _cc2002 |
||
| 300 | _a2 v. : ill. ; 28 cm | ||
| 500 | _aIncludes bibliographical references and index | ||
| 650 | _aMicrolithography - Congresses | ||
| 650 | _aPhotoresists - Congresses | ||
| 700 | _aFedynyshyn, Theodore H | ||
| 710 | _aInternational SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers | ||
| 990 | _ae3a12cefac10000c482bb801d1a27b52 | ||
| 991 | _a373056 | ||
| 999 |
_c363608 _d363608 |
||