| 000 | 00928nam a2200241Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2010##################000#0#eng## | ||
| 020 | _a9780819480538 | ||
| 022 | _a2010459431 | ||
| 040 |
_aACL _cACL |
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| 082 | _a621.381531 ALL | ||
| 245 |
_aAdvances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States _cRobert D. Allen, Mark H. Somervell, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) |
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| 260 |
_aBellingham, Wash _bSPIE _c2010 |
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| 300 | _a2 v. (various pagings) : ill. ; 28 cm | ||
| 500 | _aIncludes bibliographical references | ||
| 650 | _aMicrolithography - Congresses | ||
| 650 | _aPhotoresists - Congresses | ||
| 700 | _aAllen, Robert D | ||
| 700 | _aSomervell, Mark Howell | ||
| 710 | _aSPIE (Society) | ||
| 990 | _adf04ff78ac10000c767da4261d3bf61e | ||
| 991 | _a371113 | ||
| 999 |
_c363606 _d363606 |
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