| 000 | 01216nam a2200241Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2006##################000#0#eng## | ||
| 020 | _a9780819464446 | ||
| 022 | _a2007271488 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381531 MAR | ||
| 245 |
_aPhotomask technology 2006 : 19-22 September, 2006, Monterey, California, USA _cPatrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering |
||
| 260 |
_aBellingham, WA _bSPIE _cc2006 |
||
| 300 | _a(various pagings) : ill. (some col.) ; 28 cm | ||
| 500 | _aIncludes bibliographical references and index | ||
| 650 | _aIntegrated circuits - Masks - Congresses | ||
| 650 | _aMicrolithography - Congresses | ||
| 700 | _aMartin, Patrick M | ||
| 700 | _aNaber, Robert J | ||
| 710 | _aBACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Symposium on Photomask Technology (26th : 2006 : Monterey, Calif.) | ||
| 990 | _a020a198eac10000c406865cccd0f24a9 | ||
| 991 | _a261847 | ||
| 999 |
_c35829 _d35829 |
||