| 000 | 01057nam a2200265Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2009##################000#0#eng## | ||
| 020 | _a9780819476562 | ||
| 022 | _a2010287868 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381531 HOS | ||
| 245 |
_aPhotomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan _cKunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE |
||
| 260 |
_aBellingham, WA _bSPIE _cc2009 |
||
| 300 | _a1 v. (various pagings) : ill. ; 28 cm | ||
| 500 | _aIncludes bibliographical references and author index | ||
| 650 | _aIntegrated circuits - Masks - Congresses | ||
| 650 | _aMasks (Electronics) - Congresses | ||
| 650 | _aMicrolithography - Congresses | ||
| 650 | _aOptoelectronic devices - Design and construction - Congresses | ||
| 650 | _aX-ray lithography - Congresses | ||
| 700 | _aHosono, Kunihiro | ||
| 710 | _aBACUS (Technical group), Photomask Japan, SPIE (Society) | ||
| 990 | _aa78c536fac10000c2c512c9a2649301e | ||
| 991 | _a342511 | ||
| 999 |
_c35826 _d35826 |
||