000			01531nam a2200265Ia 4500
008			191130s2005##################000#0#eng##
020			_a9780819458537
022			_a2005284357
040			_aACL _cACL
082			_a621.3815 KOM
245			_aPhotomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan _cMasanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering
260			_aBellingham, WA _bSPIE _cc2005
300			_a2 v. (xli, 1048 p.) : ill. ; 28 cm
500			_aSome earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index
650			_aIntegrated circuits - Masks - Congresses
650			_aMasks (Electronics) - Congresses
650			_aMicrolithography - Congresses
650			_aOptoelectronic devices - Design and construction - Congresses
650			_aX-ray lithography - Congresses
700			_aKomuro, Masanori
710			_aBACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers
990			_adf0baf9aac10000c60b974acf2c51954
991			_a371149
999			_c35825 _d35825