| 000 | 01055nam a2200253Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2009##################000#0#eng## | ||
| 020 | _a9780819475251 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381548 ALL | ||
| 245 |
_aMetrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States _cJohn A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) |
||
| 260 |
_aBellingham, WA _bSPIE _c2009 |
||
| 300 | _a2 v. : ill. ; 28 cm | ||
| 500 | _aIncludes bibliographical references and index | ||
| 650 | _aIntegrated circuits - Inspection - Congresses | ||
| 650 | _aIntegrated circuits - Measurement - Congresses | ||
| 650 | _aMicrolithography - Congresses | ||
| 650 | _aProcess control - Congresses | ||
| 700 | _aAllgair, John A | ||
| 700 | _aRaymond, Christopher J | ||
| 710 | _aInternational SEMATECH, SPIE (Society) | ||
| 990 | _aa78b3f65ac10000c72e865a2ee7ae451 | ||
| 991 | _a342505 | ||
| 999 |
_c273582 _d273582 |
||