| 000 | 01182nam a2200253Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s1999##################000#0#eng## | ||
| 020 | _a9780819431516 | ||
| 022 | _a697933 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381531 SIN | ||
| 245 |
_aMetrology, inspection, and process control for microlithography XIII : 15-18 march, 1999, Santa Clara, California _cBhanwar Singh, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International |
||
| 260 |
_aBellingham, WA _bSPIE _cc1999 |
||
| 300 | _a2 v. (xv, 1052 p.) : ill. ; 28 cm | ||
| 500 | _aIncludes bibliographical references and author index | ||
| 650 | _aIntegrated circuits - Inspection - Congresses | ||
| 650 | _aIntegrated circuits - Measurement - Congresses | ||
| 650 | _aMicrolithography - Congresses | ||
| 650 | _aProcess control - Congresses | ||
| 700 | _aSingh, Bhanwar | ||
| 710 | _aSemiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers | ||
| 990 | _ac4783093ac10000c225bc6b226129c57 | ||
| 991 | _a357908 | ||
| 999 |
_c273580 _d273580 |
||