| 000 | 01044nam a2200229Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2007##################000#0#eng## | ||
| 020 | _a9780819466389 | ||
| 022 | _a2009284505 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381 DUP | ||
| 245 |
_aAdvances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA _cQinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH |
||
| 260 |
_aBellingham, Wash _bSPIE _cc2007 |
||
| 300 | _a2 v. : ill. ; 28 cm | ||
| 500 | _aPrevious conference proceedings entitled: Advances in resist technology and processing. Includes bibliographical references and author index | ||
| 650 | _aMicrolithography - Congresses | ||
| 650 | _aPhotoresists - Congresses | ||
| 700 | _aLin, Qinghuang | ||
| 710 | _aSEMATECH (Organization), Society of Photo-optical Instrumentation Engineers | ||
| 990 | _ae95ea213ac10000c331ef1ab68ce4267 | ||
| 991 | _a376202 | ||
| 999 |
_c240693 _d240693 |
||