000 00638nam a2200193Ia 4500
008 191130s2007##################000#0#eng##
020 _a9780819466365
040 _aACL
_cACL
082 _a621.381531 LER
100 _aLercel, Michael J
245 _aEmerging lithographic technologies XI 27 February-1 march 2007, San Jose, California, USA
_cMichael J.Lercel
260 _aCalifornia
_bSPIE - Proceeding
_c2007
300 _avarious pagings. ; 30 cm
650 _aLithography, Electron beam
650 _aLithography--Industrial applications
990 _ac9dea049ac10000c41b08ab253ec344e
991 _a360422
999 _c159678
_d159678