| 000 | 01311nam a2200277Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2005##################000#0#eng## | ||
| 020 | _a9780819457363 | ||
| 022 | _a2006272389 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381 LIE | ||
| 245 |
_aDesign and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA _cLars W. Liebmann, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH |
||
| 260 |
_aBellingham, Wash _bSPIE _cc2005 |
||
| 300 | _axxxv, 438 p. : ill. (some col.) ; 28 cm | ||
| 500 | _aIncludes bibliographical references and author index | ||
| 650 | _aIntegrated circuits - Defects - Analysis - Congresses | ||
| 650 | _aIntegrated circuits - Design and construction - Congresses | ||
| 650 | _aMicroelectronics industry - Quality control - Congresses | ||
| 650 | _aQuality control - Congresses | ||
| 650 | _aSemiconductor wafers - Defects - Analysis - Congresses | ||
| 650 | _aSemiconductors - Design and construction - Congresses | ||
| 700 | _aLiebmann, Lars W | ||
| 710 | _aInternational SEMATECH, Society of Photo-optical Instrumentation Engineers | ||
| 990 | _ad932e753ac10000c599b7af7f926b863 | ||
| 991 | _a367361 | ||
| 999 |
_c147489 _d147489 |
||