| 000 | 01423nam a2200277Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2004##################000#0#eng## | ||
| 020 | _a9780819452924 | ||
| 022 | _a2004303081 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.381 LIE | ||
| 245 |
_aDesign and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA _cLars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH |
||
| 260 |
_aBellingham, Wash _bSPIE _cc2004 |
||
| 300 | _axxviii, 302 p. : ill., ports. ; 28 cm | ||
| 500 | _aIncludes bibliographical references and index | ||
| 650 | _aIntegrated circuits - Defects - Analysis - Congresses | ||
| 650 | _aIntegrated circuits - Design and construction - Congresses | ||
| 650 | _aMicroelectronics industry - Quality control - Congresses | ||
| 650 | _aQuality control - Congresses | ||
| 650 | _aSemiconductor wafers - Defects - Analysis - Congresses | ||
| 650 | _aSemiconductors - Design and construction - Congresses | ||
| 700 | _aLiebmann, Lars W | ||
| 710 | _aInternational SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers | ||
| 990 | _ac99f5a90ac10000c63dbef5871682d84 | ||
| 991 | _a360069 | ||
| 999 |
_c147488 _d147488 |
||