000			01281nam a2200253Ia 4500
008			191130s2004##################000#0#eng##
020			_a9780819452917
022			_a2004303114
040			_aACL _cACL
082			_a660.2815 TOB
245			_aData analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA _cKenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH
260			_aBellingham, Wash _bSPIE _cc2004
300			_axxx, 248 p. : ill. ; 28 cm
500			_aIncludes bibliographical references and index
650			_aIntelligent control systems - Mathematical models - Congresses
650			_aManufacturing processes - Automatic control - Congresses
650			_aManufacturing processes - Mathematical models - Congresses
650			_aProcess control - Mathematical models - Congresses
700			_aTobin, Kenneth W
710			_aInternational SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers
990			_a974ecb90ac10000c2aa0ad3b9fa6ab2e
991			_a334302
999			_c144806 _d144806