| 000 | 01049nam a2200265Ia 4500 | ||
|---|---|---|---|
| 008 | 191130s2002##################000#0#eng## | ||
| 020 | _a9781402071935 | ||
| 022 | _a2002028782 | ||
| 040 |
_aACL _cACL |
||
| 082 | _a621.38152 BOR | ||
| 100 | _aBorst, Christopher L | ||
| 245 |
_aChemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology _cby Christopher L. Borst, William N. Gill, Ronald J. Gutmann |
||
| 260 |
_aDeventer, The Netherlands ; Boston, MA _bKluwer Academic Publishers _c2002 |
||
| 300 | _axiv, 229 p. : ill. ; 25 cm | ||
| 500 | _aIncludes bibliographical references and index | ||
| 650 | _aChemical mechanical planarization | ||
| 650 | _aGrinding and polishing | ||
| 650 | _aInterconnects (Integrated circuit technology) | ||
| 650 | _aSemiconductors - Polishing | ||
| 700 | _aGill, William N | ||
| 700 | _aGutmann, Ronald J | ||
| 990 | _a2e70c462ac10000c0f6e321b817f7420 | ||
| 991 | _a149096 | ||
| 999 |
_c127352 _d127352 |
||