000 | 01268nam a2200265Ia 4500 | ||
---|---|---|---|
008 | 191130s2000##################000#0#eng## | ||
020 | _a9780819438980 | ||
022 | _a2001277535 | ||
040 |
_aACL _cACL |
||
082 | _a621.3815 MAC | ||
245 |
_aMicrolithographic techniques in integrated circuit fabrication II : 28-30 November 2000, Singapore _cChris A. Mack, Xiaocong Yuan, chairs/editors ; sponsored by Nanyang Technological University (Singapore) [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Institute of Physics (Singapore) ... [et al.] |
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260 |
_aBellingham, WA _bSPIE _c2000 |
||
300 | _axv, 194 p. : ill. ; 28 cm | ||
500 | _aIncludes bibliographical references and index | ||
650 | _aIntegrated circuits - Design and construction - Congresses | ||
650 | _aIntegrated circuits - Inspection - Congresses | ||
650 | _aMicrolithography - Industrial applications - Congresses | ||
650 | _aProcess control - Congresses | ||
700 | _aMack, Chris A | ||
700 | _aYuan, Xiaocong | ||
710 | _aInstitute of Physics, Singapore, Nanyang Technological University, Society of Photo-optical Instrumentation Engineers | ||
990 | _ae9802f8cac10000c18897fc3997587b4 | ||
991 | _a376461 | ||
999 |
_c10233 _d10233 |