000 01268nam a2200265Ia 4500
008 191130s2000##################000#0#eng##
020 _a9780819438980
022 _a2001277535
040 _aACL
_cACL
082 _a621.3815 MAC
245 _aMicrolithographic techniques in integrated circuit fabrication II : 28-30 November 2000, Singapore
_cChris A. Mack, Xiaocong Yuan, chairs/editors ; sponsored by Nanyang Technological University (Singapore) [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Institute of Physics (Singapore) ... [et al.]
260 _aBellingham, WA
_bSPIE
_c2000
300 _axv, 194 p. : ill. ; 28 cm
500 _aIncludes bibliographical references and index
650 _aIntegrated circuits - Design and construction - Congresses
650 _aIntegrated circuits - Inspection - Congresses
650 _aMicrolithography - Industrial applications - Congresses
650 _aProcess control - Congresses
700 _aMack, Chris A
700 _aYuan, Xiaocong
710 _aInstitute of Physics, Singapore, Nanyang Technological University, Society of Photo-optical Instrumentation Engineers
990 _ae9802f8cac10000c18897fc3997587b4
991 _a376461
999 _c10233
_d10233