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Results of search for 'su:"Semiconductors - Etching"'
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Authors
Bowden, M. J
Brainard, Robert L
Fujita, K
Handa, S
Hitchon, W. Nicholas...
Lin, Burn Jeng
Mack, Chris A
Stansfield, Barry L
Stevenson, Tom
Sugawara, M
Thompson, L. F
Wei, Yayi
Williams, P. F
Willson, C. G
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English Books
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Immersion lithograph...
Integrated circuits ...
Integrated circuits ...
Integrated circuits ...
Lasers - Industrial ...
Microlithography
Microlithography - C...
Photoresists - Congr...
Plasma chemistry - I...
Plasma engineering
Plasma etching
Plasma etching - Con...
Plasma etching - Ind...
Semiconductors - Etc...
Semiconductors - Etc...
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Your search returned 10 results.
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1.
Optical lithography : here is why
Burn J. Lin
by
Lin, Burn Jeng
Publication details:
Bellingham, WA
SPIE
2009
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.381531 LIN
.
2.
Plasma etching : fundamentals and applications
M. Sugawara ; with contributions from Barry L. Stonsfield ... [et al.]
by
Sugawara, M
Fujita, K
Handa, S
Stansfield, Barry L
Publication details:
Oxford
Oxford University Press
1998
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.381531 SUG
.
3.
Plasma processing of semiconductors
edited by P.F. Williams
by
Williams, P. F
NATO Advanced Study Institute on Plasma Processing of Semiconductors (1996 : Bonas, France), North Atlantic Treaty Organization. Scientific Affairs Division
Publication details:
Dordrecht ; Boston
Kluwer Academic Publishers
1997
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.38152 WIL
.
4.
Introduction to microlithography
edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden
by
Bowden, M. J
Thompson, L. F
Willson, C. G
Edition:
2nd ed
Publication details:
Washington, DC
American Chemical Society
1994
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.381531 THO
.
5.
Lithography for semiconductor manufacturing II : 30 may-1 June, 2001, Edinburgh, UK
Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)
by
Mack, Chris A
Stevenson, Tom
European Optical Society, Institution of Electrical Engineers, Scottish Enterprise, Society of Photo-optical Instrumentation Engineers
Publication details:
Bellingham, WA
SPIE
c2001
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
670 MAC
.
6.
Plasma processes for semiconductor fabrication
W.N.G. Hitchon
by
Hitchon, W. Nicholas G
Publication details:
Cambridge
Cambridge University Press
1999
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.38152 HIT
.
7.
Plasma processes for semiconductor fabrication
W.N.G. Hitchon
by
Hitchon, W. Nicholas G
Publication details:
Cambridge
Cambridge University Press
1999
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.38152 HIT
.
8.
Advanced processes for 193-nm immersion lithography
Yayi Wei, Robert L. Brainard
by
Wei, Yayi
Brainard, Robert L
Publication details:
Bellingham, Wash
SPIE
2009
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.381531 WEI
.
9.
Plasma processes for semiconductor fabrication
W.N.G. Hitchon
by
Hitchon, W. Nicholas G
Publication details:
Cambridge
Cambridge University Press
1999
Availability:
No items available.
10.
Plasma processes for semiconductor fabrication
W.N.G. Hitchon
by
Hitchon, W. Nicholas G
Publication details:
Cambridge
Cambridge University Press
1999
Availability:
No items available.
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