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	1.		Microelectronics technology : polymers for advanced imaging and packaging : developed from a symposium sponsored by the ACS division of polymeric materials: science and engineering, Inc., and the polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the 209th national meeting of the American Chemical Society, Anaheim, California, April 2-6, 1995 Elsa Reichmanis ... [et al., editors] by Iwayanagi, Takao MacDonald, Scott A Nishikubo, Tadatomi American Chemical Society. Division of Polymeric Materials: Science and Engineering, American Chemical Society. Meeting (209th : 1995 : Anaheim, Calif.), Kōbunshi Gakkai (Japan). Polymers for Microelectronics Division Publication details: Washington, DC American Chemical Society c1995 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381046 REI.
	2.		Polymers in microlithography : materials and processes Elsa Reichmanis, editor, Scott A. MacDonald, editor, Takao Iwayanagi, editor by Iwayanagi, Takao MacDonald, Scott A Reichmanis, Elsa American Chemical Society. Division of Polymeric Materials: Science and Engineering Publication details: Washington, DC American Chemical Society 1989 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 REI.
	3.		Diazonaphthoquinone-based resists Ralph Dammel by Dammel, Ralph Publication details: Bellingham, WA SPIE Optical Engineering Press 1993 Availability: Items available for loan: Anna Centenary Library (1)Call number: 62 381531 DAM.
	4.		Introduction to microlithography edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden by Bowden, M. J Thompson, L. F Willson, C. G Edition: 2nd ed Publication details: Washington, DC American Chemical Society 1994 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 THO.
	5.		Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH by Lin, Qinghuang SEMATECH (Organization), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2007 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381 DUP, ...
	6.		Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA) by Henderson, Clifford L International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE 2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.31 HEN, ...
	7.		Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States Robert D. Allen, Mark H. Somervell, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Allen, Robert D Somervell, Mark Howell SPIE (Society) Publication details: Bellingham, Wash SPIE 2010 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 ALL, ...
	8.		Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Fedynyshyn, Theodore H International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2002 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 FED.
	9.		Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA Houlihan, Francis M by Houlihan, Francis M Publication details: Bellingham, WA SPIE 2000 Availability: Items available for loan: Anna Centenary Library (2)Call number: 686.2325 HOU, ...
	10.		Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Houlihan, Francis M International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 HOU.
	11.		Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International by Fedynyshyn, Theodore H International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2003 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 FED, ...
	12.		Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Sturtevant, John L International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2004 Availability: Items available for loan: Anna Centenary Library (2)Call number: 686.2325 STU, ...

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