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Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH by
Publication details: Bellingham, WA SPIE c2003
Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 HER, ...
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Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by
Publication details: Bellingham, WA SPIE 2008
Availability: Items available for loan: Anna Centenary Library (2)Call number: 539.752 ALL, ...
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Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan by
Publication details: Bellingham, WA SPIE c2000
Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 MOR.
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EMLC 2005 : 21st European mask and lithography conference : 31 January-3 February, 2005, Dresden, Germany Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--the Society for Microelectronics, Micro- and Precision Engineering (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ... [et al.] ; copublished by, SPIE--the International Society for Optical Engineering and VDE Verlag GmbH (Germany) by
Publication details: Bellingham, Wash., ; Berlin, Germany SPIE ; VDE Verlag GmbH c2005
Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.38173 BEH.
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Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by
Publication details: Bellingham, WA SPIE 2009
Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381548 ALL, ...
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Advanced microlithography technologies : 8-10 November, 2004, Beijing, China Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors, ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society ... [et al.] ; supporting organizations, National Natural Science Foundation of China ... [et al.] by
Publication details: Bellingham, Wash SPIE c2005
Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 WAN.
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