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	1.		Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2002 (2002 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
	2.		Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan by Morimoto, Hiraoki BACUS (Technical group), Denki Gakkai (1888), Ōyō Butsuri Gakkai, Photomask Japan, Seimitsu Kōgakkai, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2000 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 MOR.
	3.		Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
	4.		Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2003 (2003 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 TAN.
	5.		Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Institute of Electrical and Electronics Engineers. Japan Section, Photomask Japan, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2004 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 TAN, ...
	6.		Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Komuro, Masanori BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 KOM, ...
	7.		Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE by Hosono, Kunihiro BACUS (Technical group), Photomask Japan, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 HOS.
	8.		Photomask and x-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.] by Morimoto, Hiraoki BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 MOR.
	9.		Photomask fabrication technology Benjamin G. Eynon, Jr., Banqiu Wu by Eynon, Benjamin G Wu, Banqiu Publication details: New York McGraw-Hill 2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 EYN.
	10.		Photomask technology 2009 : 14-17 September 2009, Monterey, California, United States Larry S. Zurbrick, M. Warren Montgomery, editors ; sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology [and] SPIE by Montgomery, M. Warren Zurbrick, Larry S BACUS (Technical group), SPIE (Society), Symposium on Photomask Technology (29th : 2009 : Monterey, Calif.) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 ZUR, ...
	11.		Diazonaphthoquinone-based resists Ralph Dammel by Dammel, Ralph Publication details: Bellingham, WA SPIE Optical Engineering Press 1993 Availability: Items available for loan: Anna Centenary Library (1)Call number: 62 381531 DAM.
	12.		Emerging lithographic technologies III : 15-17 march, 1999, Santa Clara, California Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International by Vladimirsky, Yuli Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 VLA.
	13.		Emerging lithographic technologies IX : 1-3 march 2005, San Jose, California, USA R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Mackay, R. Scott International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 686.2315 MAC, ...
	14.		Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Engelstad, Roxann L International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 ENG, ...
	15.		Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA) by Lercel, Michael J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 LER, ...
	16.		Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA) by Schellenberg, F. M International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 SCH, ...
	17.		Handbook of photomask manufacturing technology edited by Syed Rizvi by Rizvi, Syed Publication details: Baca Raton, FL Taylor & Francis c2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 006.696 RIZ.
	18.		Lithography Asia 2009 : 18-19 November 2009, Taipei, Taiwan Alek C. Chen ... [et al.] (Eds.) ; spons. and publ. by SPIE - The International Society for Optical Engineering by Chen, Alek C Society of Photo-optical Instrumentation Engineers (United States) Publication details: Bellingham, WA SPIE 2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 CHE.
	19.		Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States Frank M. Schellenberg, Bruno M. La Fontaine, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc by La Fontaine, Bruno M Schellenberg, F. M International SEMATECH, SPIE (Society) Publication details: Bellingham, Wash SPIE c2009- Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 SCH, ...
	20.		Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH by Mackay, R. Scott International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 686.2315 MAC.
	21.		Lithography Asia 2008 : 4-6 November 2008, Taipei, Taiwan Alek C. Chen, Burn Lin, Anthony Yen, editors ; sponsored and published by SPIE ; cooperating organization, TSIA--Taiwan Semiconducrtor Industry Association by Chen, Alek C Lin, Burn Yen, Anthony SPIE (Society), Taiwan Semiconductor Industry Association Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 CHE, ...
	22.		Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 HOG, ...
	23.		Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States Daniel J.C. Herr, editor ; sponsored by SPIE; cooperating organization, SEMATECH Inc by Herr, Daniel J. C SEMATECH (Organization), SPIE (Society) Publication details: Bellingham, Wash SPIE c2010 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 HER.
	24.		Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: No items available.

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