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1.	Image from Google Jackets	Micro- and nano-electronics 2003 : 6-10 October 2003, Zvenigorod, Russia Kamil A. Valiev, Alexander A. Orlikovsky, chairs/editors ; organized by FTIAN--Institute of Physics and Technology, Russian Academy of Sciences [and] SPIE Russia Chapter ; sponsored by Ministry of Industry, Science, and Technologies of Russian Federation ... [et al.] by Orlikovskiĭ, A. A Valiev, Kamilʹ Akhmetovich Fiziko-tekhnologicheskiĭ institut (Rossiĭskai︠a︡ akademii︠a︡ nauk), ICMNE-2003 (2003 : Zvenigorod, Russia), Russia (Federation). Ministerstvo promyshlennosti, nauki i tekhnologiĭ, Society of Photo-optical Instrumentation Engineers, Society of Photo-optical Instrumentation Engineers. Russian Chapter Publication details: Bellingham, WA SPIE c2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381 VAL.
2.	Image from Google Jackets	Micro- and nanoelectronics 2005 : 3-7 October 2005, Zvenigorod, Russia Kamil A. Valiev, Alexander A. Orlikovsky, chairs/editors ; organized by FTIAN--Institute of Physics and Technology (Russia) [and] SPIE Russia Chapter ; sponsored by Ministry of Education and Science of the Russian Federation (Russia) ... [et al.] ; published by SPIE--the International Society for Optical Engineering by Orlikovskiĭ, A. A Valiev, Kamilʹ Akhmetovich Fiziko-tekhnologicheskiĭ institut (Rossiĭskai︠a︡ akademii︠a︡ nauk), ICMNE-2005 (2005 : Zvenigorod, Russia), Russia (Federation). Ministerstvo nauki, vyssheĭ shkoly i tekhnicheskoĭ politiki, Society of Photo-optical Instrumentation Engineers, Society of Photo-optical Instrumentation Engineers. Russian Chapter Publication details: Bellingham, WA SPIE c2006 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381 VAL.
3.	Image from Google Jackets	Nanofabrication : fundamentals and applications editor, Ampere A. Tseng by Tse, Ampere A Publication details: Singapore ; Hackensack, N.J World Scientific c2008 Availability: Items available for loan: Anna Centenary Library (1)Call number: 620.5 TSE.
4.	Image from Google Jackets	Optical microlithography XIV : 27 February-2 march, 2001, Santa Clara, [California], USA Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Progler, Christopher J International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 PRO, ...
5.	Image from Google Jackets	Optical microlithography XV : 5-8 march, 2002, Santa Clara, [California], USA Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Yen, Anthony International SEMATECH (Organization), Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2002 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 YEN, ...
6.	Image from Google Jackets	Optical microlithography XX : 27 February - 2 march 2007, San Jose, California, USA Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc by Flagello, Donis G SEMATECH, Inc, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2007 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621.381531 FLA.1, ...
7.	Image from Google Jackets	Optical microlithography XXIII : 23-25 February 2010, San Jose, California, United States Mircea V. Dusa, Will Conley, editors ; sponsored and published by SPIE; cooperating organization, SEMATECH Inc. (United States) by Conley, Willard Dusa, Mircea V SEMATECH (Organization), SPIE (Society) Publication details: Bellingham, WA SPIE c2010 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 DUS, ...
8.	Image from Google Jackets	Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2002 (2002 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
9.	Image from Google Jackets	Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan by Morimoto, Hiraoki BACUS (Technical group), Denki Gakkai (1888), Ōyō Butsuri Gakkai, Photomask Japan, Seimitsu Kōgakkai, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2000 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 MOR.
10.	Image from Google Jackets	Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
11.	Image from Google Jackets	Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2003 (2003 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 TAN.
12.	Image from Google Jackets	Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Institute of Electrical and Electronics Engineers. Japan Section, Photomask Japan, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2004 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 TAN, ...
13.	Image from Google Jackets	Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Komuro, Masanori BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 KOM, ...
14.	Image from Google Jackets	Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE by Hosono, Kunihiro BACUS (Technical group), Photomask Japan, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 HOS.
15.	Image from Google Jackets	Photomask and x-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.] by Morimoto, Hiraoki BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 MOR.
16.	Image from Google Jackets	Plate lithography Paul Croft by Croft, Paul Publication details: London A & C Black 2003 Availability: Items available for loan: Anna Centenary Library (1)Call number: 769 CRO.
17.	Image from Google Jackets	Prints and drawings of Käthe Kollwitz Selected with introd. by Carl Zigrosser by Kollwitz, Käthe Zigrosser, Carl Publication details: Mineola, NY Dover Publications c1969 Availability: Items available for loan: Anna Centenary Library (1)Call number: 760.092 ZIG.
18.	Image from Google Jackets	Emerging lithographic technologies III : 15-17 march, 1999, Santa Clara, California Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International by Vladimirsky, Yuli Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 VLA.
19.	Image from Google Jackets	Emerging lithographic technologies IX : 1-3 march 2005, San Jose, California, USA R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Mackay, R. Scott International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 686.2315 MAC, ...
20.	Image from Google Jackets	Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Engelstad, Roxann L International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 ENG, ...
21.	Image from Google Jackets	Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA) by Lercel, Michael J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 LER, ...
22.	Image from Google Jackets	Emerging lithographic technologies XI 27 February-1 march 2007, San Jose, California, USA Michael J.Lercel by Lercel, Michael J Publication details: California SPIE - Proceeding 2007 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 LER.
23.	Image from Google Jackets	Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA) by Schellenberg, F. M International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 SCH, ...
24.	Image from Google Jackets	EUV sources for lithography [edited by] Vivek Bakshi by Bakshi, Vivek Publication details: Bellingham, WA SPIE Press 2006 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.364 BAK.
25.	Image from Google Jackets	EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado Carolyn A. MacDonald ... [et al.], chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering by MacDonald, Carolyn Ann Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.36 MAC.
26.	Image from Google Jackets	Extreme ultraviolet (EUV) lithography : 22-25 February 2010, San Jose, California, United States Bruno M. La Fontaine, editor ; sponsored by SPIE ; cooperating organization SEMATECH Inc. (United States) by La Fontaine, Bruno M SEMATECH (Organization), SPIE (Society) Publication details: Bellingham, WA SPIE 2010 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 FON, ...
27.	Image from Google Jackets	Extreme ultraviolet lithography [edited by] Banqiu Wu, Ajay Kumar by Kumar, Ajay Wu, Banqiu Publication details: New York McGraw-Hill 2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 WU.
28.	Image from Google Jackets	Lithography Asia 2009 : 18-19 November 2009, Taipei, Taiwan Alek C. Chen ... [et al.] (Eds.) ; spons. and publ. by SPIE - The International Society for Optical Engineering by Chen, Alek C Society of Photo-optical Instrumentation Engineers (United States) Publication details: Bellingham, WA SPIE 2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 CHE.
29.	Image from Google Jackets	15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany Uwe Behringer, chair/editor ; organized by VDE/VDI-Society Microelectronics, Micro- and Precision Engineering (GMM) (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe GmbH (Germany) ; cooperating organizations, SEMI-Europe--Semiconductor Equipment and Materials International, BACUS (USA), [and] SPIE--the International Society for Optical Engineering by Behringer, Uwe F. W BACUS (Technical group), European Conference on Mask Technology for Integrated Circuits and Microcomponents (15th : 1998 : Munich-Unterhaching, Germany), Forschungszentrum Karlsruhe. Institute for Microstructure Technology, Semiconductor Equipment and Materials International, Europe, Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.38173 BEH.
30.	Image from Google Jackets	Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States Frank M. Schellenberg, Bruno M. La Fontaine, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc by La Fontaine, Bruno M Schellenberg, F. M International SEMATECH, SPIE (Society) Publication details: Bellingham, Wash SPIE c2009- Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 SCH, ...
31.	Image from Google Jackets	Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH by Mackay, R. Scott International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 686.2315 MAC.
32.	Image from Google Jackets	Lithography Asia 2008 : 4-6 November 2008, Taipei, Taiwan Alek C. Chen, Burn Lin, Anthony Yen, editors ; sponsored and published by SPIE ; cooperating organization, TSIA--Taiwan Semiconducrtor Industry Association by Chen, Alek C Lin, Burn Yen, Anthony SPIE (Society), Taiwan Semiconductor Industry Association Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 CHE, ...
33.	Image from Google Jackets	Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA Bruce W. Smith, chair/editor ; sponsored... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Smith, Bruce W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621. 366 SMI, ...
34.	Image from Google Jackets	Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Smith, Bruce W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621. 381531 SMI, ...
35.	Image from Google Jackets	Optical microlithography XXII : 24-27 February 2009, San Jose, California, United States Harry J. Levinson, Mircea V. Dusa, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Dusa, Mircea V Levinson, Harry J International SEMATECH, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (2)Call number: 670 LEV, ...
36.	Image from Google Jackets	Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2008 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621. 381531 LEV.
37.	Image from Google Jackets	Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621. 381531 LEV, ...
38.	Image from Google Jackets	Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 HOG, ...
39.	Image from Google Jackets	Senefelder on lithography : the classic 1819 treatise Alois Senefelder by Senefelder, Alois Publication details: Mineola, NY Dover Publications 2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 763.22 SEN, ...
40.	Image from Google Jackets	Advanced microlithography technologies : 8-10 November, 2004, Beijing, China Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors, ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society ... [et al.] ; supporting organizations, National Natural Science Foundation of China ... [et al.] by Progler, Christopher J Wang, Yangyuan Yao, Jun'en Australian Optical Society, Guo jia zi ran ke xue ji jin wei yuan hui (China), Society of Photo-optical Instrumentation Engineers, Zhongguo guang xue xue hui Publication details: Bellingham, Wash SPIE c2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 WAN.
41.	Image from Google Jackets	Advanced processes for 193-nm immersion lithography Yayi Wei, Robert L. Brainard by Wei, Yayi Brainard, Robert L Publication details: Bellingham, Wash SPIE 2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 WEI.
42.	Image from Google Jackets	Advances in mirror technology for x-ray, EUV lithography, laser and other applications : 7-8 August 2003, San Diego, California, USA Ali M. Khounsary, Udo Dinger, Kazuya Ota, chairs/editors, ; sponsored and published by SPIE--the International Society for Optical Engineering by Dinger, Udo Khounsary, Ali M Ota, Kazuya Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 522.6863 KHO.
43.	Image from Google Jackets	Advances in mirror technology for x-ray, EUV lithography, laser and other applications II : 5 August, 2004, Denver, Colorado, USA Ali M. Khounsary, Udo Dinger, Kazuya Ota, chairs/editors, ; sponsored and published by SPIE--the International Society for Optical Engineering by Dinger, Udo Khounsary, Ali M Ota, Kazuya Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 681.428 KHQ.
44.	Image from Google Jackets	Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States Daniel J.C. Herr, editor ; sponsored by SPIE; cooperating organization, SEMATECH Inc by Herr, Daniel J. C SEMATECH (Organization), SPIE (Society) Publication details: Bellingham, Wash SPIE c2010 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 HER.
45.	Image from Google Jackets	Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA Bruce W. Smith, chair/editor ; sponsored... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Smith, Bruce W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: No items available.
46.	Image from Google Jackets	Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Smith, Bruce W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: No items available.
47.	Image from Google Jackets	Optical microlithography XXII : 24-27 February 2009, San Jose, California, United States Harry J. Levinson, Mircea V. Dusa, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Dusa, Mircea V Levinson, Harry J International SEMATECH, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: No items available.
48.	Image from Google Jackets	Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2008 Availability: No items available.
49.	Image from Google Jackets	Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: No items available.
50.	Image from Google Jackets	Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: No items available.
51.	Image from Google Jackets	Senefelder on lithography : the classic 1819 treatise Alois Senefelder by Senefelder, Alois Publication details: Mineola, NY Dover Publications 2005 Availability: No items available.
52.	Image from Google Jackets	Stone Lithography : by Croft, Paul [author.] Publication details: A&C Black, 2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 763.22 CRO.

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