Your search returned 43 results.

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	1.		Microlithography : science and technology edited by Kazuaki Suzuki, Bruce W. Smith by Smith, Bruce W Suzuki, Kazuaki Edition: 2nd ed Publication details: Boca Raton, FL CRC Press 2007 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 SUZ.
	2.		Optical microlithography XIV : 27 February-2 march, 2001, Santa Clara, [California], USA Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Progler, Christopher J International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 PRO, ...
	3.		Optical microlithography XV : 5-8 march, 2002, Santa Clara, [California], USA Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Yen, Anthony International SEMATECH (Organization), Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2002 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 YEN, ...
	4.		Optical microlithography XX : 27 February - 2 march 2007, San Jose, California, USA Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc by Flagello, Donis G SEMATECH, Inc, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2007 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621.381531 FLA.1, ...
	5.		Optical microlithography XXIII : 23-25 February 2010, San Jose, California, United States Mircea V. Dusa, Will Conley, editors ; sponsored and published by SPIE; cooperating organization, SEMATECH Inc. (United States) by Conley, Willard Dusa, Mircea V SEMATECH (Organization), SPIE (Society) Publication details: Bellingham, WA SPIE c2010 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 DUS, ...
	6.		Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2002 (2002 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
	7.		Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan by Morimoto, Hiraoki BACUS (Technical group), Denki Gakkai (1888), Ōyō Butsuri Gakkai, Photomask Japan, Seimitsu Kōgakkai, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2000 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 MOR.
	8.		Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
	9.		Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2003 (2003 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 TAN.
	10.		Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Institute of Electrical and Electronics Engineers. Japan Section, Photomask Japan, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2004 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 TAN, ...
	11.		Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Komuro, Masanori BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 KOM, ...
	12.		Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE by Hosono, Kunihiro BACUS (Technical group), Photomask Japan, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 HOS.
	13.		Photomask and x-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.] by Morimoto, Hiraoki BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 MOR.
	14.		Photomask fabrication technology Benjamin G. Eynon, Jr., Banqiu Wu by Eynon, Benjamin G Wu, Banqiu Publication details: New York McGraw-Hill 2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 EYN.
	15.		Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering by Martin, Patrick M Naber, Robert J BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Symposium on Photomask Technology (26th : 2006 : Monterey, Calif.) Publication details: Bellingham, WA SPIE c2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 MAR, ...
	16.		Photomask technology 2008 : 7-10 October 2008, Monterey, California, USA Hiroichi Kawahira, Larry S. Zurbrick, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE by Kawahira, Hiroichi Zurbrick, Larry S BACUS (Technical group), SPIE (Society), Symposium on Photomask Technology (28th : 2008 : Monterey, Calif.) Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 KAW, ...
	17.		Photomask technology 2009 : 14-17 September 2009, Monterey, California, United States Larry S. Zurbrick, M. Warren Montgomery, editors ; sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology [and] SPIE by Montgomery, M. Warren Zurbrick, Larry S BACUS (Technical group), SPIE (Society), Symposium on Photomask Technology (29th : 2009 : Monterey, Calif.) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 ZUR, ...
	18.		EMLC 2005 : 21st European mask and lithography conference : 31 January-3 February, 2005, Dresden, Germany Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--the Society for Microelectronics, Micro- and Precision Engineering (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ... [et al.] ; copublished by, SPIE--the International Society for Optical Engineering and VDE Verlag GmbH (Germany) by Behringer, Uwe F. W European Conference on Mask Technology for Integrated Circuits and Microcomponents (21st : 2005 : Dresden, Germany), Institut für Mikrostrukturtechnik, Semiconductor Equipment and Materials International, Europe, Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, Wash., ; Berlin, Germany SPIE ; VDE Verlag GmbH c2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.38173 BEH.
	19.		EMLC 2007 : 23rd European mask and lithography conference : 22-25 January 2007, Grenoble, France Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, CEA-LETI (France) ... [et al.] ; published by SPIE--the International Society for Optical Engineering by Behringer, Uwe F. W Maurer, Wilhelm Waelpoel, Jacques CEA-LETI, European Mask and Lithography Conference (23rd : 2007 : Grenoble, France), Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2007 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 BEH.
	20.		EMLC 2008 : 24th European mask and lithography conference : 21-24 January 2008, Dresden, Germany Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ... [et al.] by Behringer, Uwe F. W Maurer, Wilhelm Waelpoel, Jacques BACUS (Technical group), European Mask and Lithography Conference (24th : 2008 : Dresden, Germany), Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.38173 BEH.
	21.		Extreme ultraviolet lithography [edited by] Banqiu Wu, Ajay Kumar by Kumar, Ajay Wu, Banqiu Publication details: New York McGraw-Hill 2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 WU.
	22.		15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany Uwe Behringer, chair/editor ; organized by VDE/VDI-Society Microelectronics, Micro- and Precision Engineering (GMM) (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe GmbH (Germany) ; cooperating organizations, SEMI-Europe--Semiconductor Equipment and Materials International, BACUS (USA), [and] SPIE--the International Society for Optical Engineering by Behringer, Uwe F. W BACUS (Technical group), European Conference on Mask Technology for Integrated Circuits and Microcomponents (15th : 1998 : Munich-Unterhaching, Germany), Forschungszentrum Karlsruhe. Institute for Microstructure Technology, Semiconductor Equipment and Materials International, Europe, Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.38173 BEH.
	23.		16th European conference on mask technology for integrated circuits and microcomponents : 15-16 November 1999, Munich, Germany Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI-Society Microelectronics, Micro- and Precision Engineering (GMM) (Germany) ; cooperating organization, Institute for Microstructure Technology/Forschungszentrum Karlsruhe GmbH (Germany) by Behringer, Uwe European Conference on Mask Technology for Integrated Circuits and Microcomponents (16th : 1999 : Munich, Germany), Forschungszentrum Karlsruhe. Institute for Microstructure Technology, Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2000 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 BEH.
	24.		17th European Conference on Mask Technology for Integrated Circuits and Microcomponents : proceedings : 13-14 November 2000, Munich, Germany Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI-Society and Institute for Microstructure Technology (GMM) (Germany) ; published by, SPIE--The International Society for Optical Engineering by Behringer, Uwe F. W European Conference on Mask Technology for Integrated Circuits and Microcomponents (17th : 2000 : Munich, Germany), Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 BEH.
	25.		18th European Conference on Mask Technology for Integrated Circuits and Microcomponents : proceedings : 15-16 January, 2002, Munich, Germany Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--Society Microelectronics, Micro- and Precision Engineering (GMM) ..[et al. ; published by SPIE--The International Society for Optical Engineering] by Behringer, Uwe F. W European Conference on Mask Technology for Integrated Circuits and Microcomponents (18th : 2002 : Munich, Germany), Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2002 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 BEH.
	26.		20th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 12-14 January 2004, Dresden, Germany Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI-Society Microelectronics, Micro- and Precision Engineering (GMM) (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ..[et al.] by Behringer, Uwe F. W European Conference on Mask Technology for Integrated Circuits and Microcomponents (20th : 2004 : Dresden, Germany), Forschungszentrum Karlsruhe. Institute for Microstructure Technology, Semiconductor Equipment and Materials International, Europe, Society of Photo-optical Instrumentation Engineers, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 BEH.
	27.		25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ..[et al.] by Behringer, Uwe F. W BACUS (Technical group), European Mask and Lithography Conference (25th : 2009 : Dresden, Germany), SPIE (Society), VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 BEH.
	28.		26th European Mask and Lithography Conference : 18-20 January 2010, Grenoble, France Uwe F.W. Behringer, Wilhelm Maurer, editors ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ;sponsored by CEA-LETI Grenoble, AEPI Grenoble Isere, Ville de Grenoble (France) [and] UBC Microelectronics (Germany) ; cooperating organisations, BACUS ..[et al.] by Behringer, Uwe F. W Maurer, Wilhelm BACUS (Technical group), CEA-Leti-Minatec (Firm), European Mask and Lithography Conference (26th : 2010 : Grenoble, France), SPIE (Society), UBC Microelectronics (Firm), VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik Publication details: Bellingham, WA SPIE c2010 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 BEH.
	29.		Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA Bruce W. Smith, chair/editor ; sponsored... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Smith, Bruce W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621. 366 SMI, ...
	30.		Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Smith, Bruce W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621. 381531 SMI, ...
	31.		Optical microlithography XXII : 24-27 February 2009, San Jose, California, United States Harry J. Levinson, Mircea V. Dusa, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Dusa, Mircea V Levinson, Harry J International SEMATECH, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (2)Call number: 670 LEV, ...
	32.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2008 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621. 381531 LEV.
	33.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621. 381531 LEV, ...
	34.		Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 HOG, ...
	35.		Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE by Kawahira, Hiroichi Naber, Robert J BACUS (Technical group), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2007 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621.36 NAB.6730, ...
	36.		Advanced microlithography technologies : 8-10 November, 2004, Beijing, China Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors, ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society ... [et al.] ; supporting organizations, National Natural Science Foundation of China ... [et al.] by Progler, Christopher J Wang, Yangyuan Yao, Jun'en Australian Optical Society, Guo jia zi ran ke xue ji jin wei yuan hui (China), Society of Photo-optical Instrumentation Engineers, Zhongguo guang xue xue hui Publication details: Bellingham, Wash SPIE c2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 WAN.
	37.		Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA Bruce W. Smith, chair/editor ; sponsored... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Smith, Bruce W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: No items available.
	38.		Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Smith, Bruce W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: No items available.
	39.		Optical microlithography XXII : 24-27 February 2009, San Jose, California, United States Harry J. Levinson, Mircea V. Dusa, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Dusa, Mircea V Levinson, Harry J International SEMATECH, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: No items available.
	40.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2008 Availability: No items available.
	41.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: No items available.
	42.		Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: No items available.
	43.		Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE by Kawahira, Hiroichi Naber, Robert J BACUS (Technical group), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2007 Availability: No items available.

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