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Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH by
Publication details: Bellingham, WA SPIE c2003
Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 HER, ...
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Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by
Publication details: Bellingham, WA SPIE 2008
Availability: Items available for loan: Anna Centenary Library (2)Call number: 539.752 ALL, ...
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Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by
Publication details: Bellingham, WA SPIE 2009
Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381548 ALL, ...
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