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	1.	Image from Google Jackets	Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2003 (2003 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 TAN.
	2.	Image from Google Jackets	Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Institute of Electrical and Electronics Engineers. Japan Section, Photomask Japan, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2004 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 TAN, ...
	3.	Image from Google Jackets	Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan / edited by Hiroyoshi Tanabe by Tanabe, Hiroyoshi Series: Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446 Edition: 1st ed. Language: English Publication details: Bellingham Spie c2004 Availability: Items available for reference: Anna Centenary Library: Not for loan (1)Call number: 621.381531 TAN.

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