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	1.		Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering by Ausschnitt, Christopher P Emami, Iraj Tobin, Kenneth W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 629.895 EMA.
	2.		Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA Iraj Emami, Kenneth W. Tobin, Jr. ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc by Emami, Iraj Tobin, Kenneth W International SEMATECH Publication details: Bellingham, WA SPIE c2006 Availability: Items available for loan: Anna Centenary Library (1)Call number: 629.895 EMA.

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