Advanced processes for 193-nm immersion lithography Yayi Wei, Robert L. Brainard

By:

Contributor(s):

Publication details: Bellingham, Wash SPIE 2009Description: xix, 315 p. : ill. ; 26 cmISBN:

ISSN:

Subject(s):

DDC classification:

Item type: Books

Tags from this library: No tags from this library for this title.

Average rating: 0.0 (0 votes)

Holdings
Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 WEI (Browse shelf(Opens below))	Available		424243

Includes bibliographical references and index

There are no comments on this title.

to post a comment.

Find us on the map