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Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering by
Publication details: Bellingham, Wash SPIE c2005
Availability: Items available for loan: Anna Centenary Library (1)Call number: 629.895 EMA.
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