Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH

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Publication details: Bellingham, Wash SPIE c2004Description: 2 v. (xxxviii, 1288 p.) : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	686.2325 STU (Browse shelf(Opens below))	Available		276790
Anna Centenary Library	686.2325 STU (Browse shelf(Opens below))	Available		276791

Includes bibliographical references and index

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