Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering

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Publication details: Bellingham, WA SPIE c2006Description: (various pagings) : ill. (some col.) ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 MAR (Browse shelf(Opens below))	Available		424520
Anna Centenary Library	621.381531 MAR (Browse shelf(Opens below))	Available		424521

Includes bibliographical references and index

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