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Results of search for 'au:"Kawahira, Hiroichi"'
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Kawahira, Hiroichi
Naber, Robert J
Zurbrick, Larry S
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English Books
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Integrated circuits ...
Masks (Electronics) ...
Microlithography - C...
Optoelectronic devic...
X-ray lithography - ...
Your search returned 5 results.
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1.
Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan
Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
by
Kawahira, Hiroichi
BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2002 (2002 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers
Publication details:
Bellingham, WA
SPIE
c2001
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.381531 KAW
.
2.
Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan
Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City
by
Kawahira, Hiroichi
BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers
Publication details:
Bellingham, WA
SPIE
c2001
Availability:
Items available for loan:
Anna Centenary Library
(1)
Call number:
621.381531 KAW
.
3.
Photomask technology 2008 : 7-10 October 2008, Monterey, California, USA
Hiroichi Kawahira, Larry S. Zurbrick, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE
by
Kawahira, Hiroichi
Zurbrick, Larry S
BACUS (Technical group), SPIE (Society), Symposium on Photomask Technology (28th : 2008 : Monterey, Calif.)
Publication details:
Bellingham, WA
SPIE
c2008
Availability:
Items available for loan:
Anna Centenary Library
(2)
Call number:
621.3815 KAW, ..
.
4.
Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA
Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE
by
Kawahira, Hiroichi
Naber, Robert J
BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Publication details:
Bellingham, WA
SPIE
c2007
Availability:
Items available for loan:
Anna Centenary Library
(3)
Call number:
621.36 NAB.6730, ..
.
5.
Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA
Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE
by
Kawahira, Hiroichi
Naber, Robert J
BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Publication details:
Bellingham, WA
SPIE
c2007
Availability:
No items available.
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