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Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by
Publication details: Bellingham, WA SPIE 2008
Availability: Items available for loan: Anna Centenary Library (2)Call number: 539.752 ALL, ...
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Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering by
Publication details: Bellingham, Wash SPIE c2005
Availability: Items available for loan: Anna Centenary Library (1)Call number: 629.895 EMA.
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Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA Alfred K.K. Wong, Vivek, K. Singh, chairs/editors ; cooperating organization, SEMATECH, Inc (USA) ; sponsored and published by SPIE--the International Society for Optical Engineering by
Publication details: Bellingham, Wash SPIE c2006
Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.382 WON.
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