Your search returned 36 results.

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	1.		Metrology, inspection, and process control for microlithography XV : 26 February-1 march, 2001, Santa Clara, [California] USA Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH by Sullivan, Neal T International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 SUL.
	2.		Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH by Herr, Daniel J International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 HER, ...
	3.		Metrology, inspection, and process control for microlithography XVIII : 23-26 February, 2004, Santa Clara, California, USA Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH by Silver, Richard M International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 539.752 SIL.
	4.		Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Allgair, John A Raymond, Christopher J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 539.752 ALL, ...
	5.		Optical microlithography XIV : 27 February-2 march, 2001, Santa Clara, [California], USA Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Progler, Christopher J International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 PRO, ...
	6.		Optical microlithography XV : 5-8 march, 2002, Santa Clara, [California], USA Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Yen, Anthony International SEMATECH (Organization), Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2002 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 YEN, ...
	7.		Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Tobin, Kenneth W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 660.2815 TOB.
	8.		Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering by Ausschnitt, Christopher P Emami, Iraj Tobin, Kenneth W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 629.895 EMA.
	9.		Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA Iraj Emami, Kenneth W. Tobin, Jr. ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc by Emami, Iraj Tobin, Kenneth W International SEMATECH Publication details: Bellingham, WA SPIE c2006 Availability: Items available for loan: Anna Centenary Library (1)Call number: 629.895 EMA.
	10.		Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA Lars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Liebmann, Lars W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381 LIE.
	11.		Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA Lars W. Liebmann, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Liebmann, Lars W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2005 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381 LIE.
	12.		Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA Alfred K.K. Wong, Vivek, K. Singh, chairs/editors ; cooperating organization, SEMATECH, Inc (USA) ; sponsored and published by SPIE--the International Society for Optical Engineering by Singh, Vivek K Wong, Alfred Kwok-Kit International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2006 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.382 WON.
	13.		Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA Vivek K. Singh, Michael L. Rieger, editors ; sponsored by SPIE ; cooperating organization, SEMATECH (USA) by Rieger, Michael L Singh, Vivek K International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2008 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.382 SIN.
	14.		Emerging lithographic technologies IX : 1-3 march 2005, San Jose, California, USA R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Mackay, R. Scott International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 686.2315 MAC, ...
	15.		Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Engelstad, Roxann L International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 ENG, ...
	16.		Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA) by Lercel, Michael J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 LER, ...
	17.		Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA) by Schellenberg, F. M International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 SCH, ...
	18.		Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA) by Henderson, Clifford L International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE 2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.31 HEN, ...
	19.		Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States Frank M. Schellenberg, Bruno M. La Fontaine, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc by La Fontaine, Bruno M Schellenberg, F. M International SEMATECH, SPIE (Society) Publication details: Bellingham, Wash SPIE c2009- Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 SCH, ...
	20.		Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH by Mackay, R. Scott International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: Items available for loan: Anna Centenary Library (1)Call number: 686.2315 MAC.
	21.		Metrology, inspection, and process control for microlithography XXI : 26 February- 1 march 2007, San Jose, California, USA Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA) by Archie, Chas N International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2007 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621.395 ARC, ...
	22.		Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Allgair, John A Raymond, Christopher J International SEMATECH, SPIE (Society) Publication details: Bellingham, WA SPIE 2009 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381548 ALL, ...
	23.		Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA Bruce W. Smith, chair/editor ; sponsored... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Smith, Bruce W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621. 366 SMI, ...
	24.		Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Smith, Bruce W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (3)Call number: 621. 381531 SMI, ...
	25.		Optical microlithography XXII : 24-27 February 2009, San Jose, California, United States Harry J. Levinson, Mircea V. Dusa, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Dusa, Mircea V Levinson, Harry J International SEMATECH, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: Items available for loan: Anna Centenary Library (2)Call number: 670 LEV, ...
	26.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2008 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621. 381531 LEV.
	27.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621. 381531 LEV, ...
	28.		Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Fedynyshyn, Theodore H International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2002 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 FED.
	29.		Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH by Houlihan, Francis M International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 HOU.
	30.		Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International by Fedynyshyn, Theodore H International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2003 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 FED, ...
	31.		Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Sturtevant, John L International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, Wash SPIE c2004 Availability: Items available for loan: Anna Centenary Library (2)Call number: 686.2325 STU, ...
	32.		Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA Bruce W. Smith, chair/editor ; sponsored... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH by Smith, Bruce W International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2004 Availability: No items available.
	33.		Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH by Smith, Bruce W International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: No items available.
	34.		Optical microlithography XXII : 24-27 February 2009, San Jose, California, United States Harry J. Levinson, Mircea V. Dusa, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) by Dusa, Mircea V Levinson, Harry J International SEMATECH, SPIE (Society) Publication details: Bellingham, WA SPIE c2009 Availability: No items available.
	35.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2008 Availability: No items available.
	36.		Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) by Dusa, Mircea V Levinson, Harry J International SEMATECH, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2008 Availability: No items available.

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