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Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann

By: Contributor(s): Publication details: Deventer, The Netherlands ; Boston, MA Kluwer Academic Publishers 2002Description: xiv, 229 p. : ill. ; 25 cmISBN:
  • 9781402071935
ISSN:
  • 2002028782
Subject(s): DDC classification:
  • 621.38152 BOR
Item type: Books
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Current library Call number Status Date due Barcode
Anna Centenary Library 621.38152 BOR (Browse shelf(Opens below)) Available 304305

Includes bibliographical references and index

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