Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering

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Publication details: Bellingham, WA SPIE c2001Description: xxx, 918 p. : ill. ; 28 cmISBN:

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.381531 KAW (Browse shelf(Opens below))	Available		278069

Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

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