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	1.		Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2002 (2002 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
	2.		Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City by Kawahira, Hiroichi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2001 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 KAW.
	3.		Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering by Tanabe, Hiroyoshi BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2003 (2003 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2003 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.381531 TAN.
	4.		Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering by Komuro, Masanori BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE c2005 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.3815 KOM, ...
	5.		Photomask and x-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.] by Morimoto, Hiraoki BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan Publication details: Bellingham, WA SPIE c1999 Availability: Items available for loan: Anna Centenary Library (1)Call number: 621.3815 MOR.
	6.		Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: Items available for loan: Anna Centenary Library (2)Call number: 621.381531 HOG, ...
	7.		Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) by Hoga, Morihisa BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers Publication details: Bellingham, WA SPIE 2006 Availability: No items available.

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