Kimmel, Kurt R. ;  Staud, Wolfgang  <br/><br/>
23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa 
/ edited by Kurt R. Kimmel, Wolfgang Staud 
 - 1st ed. 
 - Bellingham  Spie  c2003 
 - xix, 700 p.  : ill.  ; 29 cm. 
 - Proceedings of SPIE--the International Society for Optical Engineering  v. 5256 .
<br/><br/>Includes bibliographies and index 
<br/><br/><label>ISBN: </label>0819451436 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated Circuits Masks<br/>Microlithography
<br/><br/><label>Dewey Class. No.: </label>621.381531  / KIM