TY  - BOOK
AU  - Tanabe, Hiroyoshi 
TI  - Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan
T2  - Proceedings of SPIE--the International Society for Optical Engineering
SN  - 0819453692
U1  - 621.381531 
PY  - 2004///
CY  - Bellingham
PB  - Spie
KW  - Integrated Circuits Masks
KW  - Microlithography
N1  - Bib and Ref
ER  -