Tanabe, Hiroyoshi  <br/><br/>
Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan 
/ edited by Hiroyoshi Tanabe 
 - 1st ed. 
 - Bellingham  Spie  c2004 
 - xiii, 990 p.  : ill.  ; 28 cm. 
 - Proceedings of SPIE--the International Society for Optical Engineering  v. 5446 .
<br/><br/>Includes bibliographies and index 
<br/><br/><label>ISBN: </label>0819453692 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated Circuits Masks<br/>Microlithography
<br/><br/><label>Dewey Class. No.: </label>621.381531  / TAN