Barnat, Edward V <br/><br/>
Pulsed and pulsed bias sputtering : principles and applications 
by Edward V. Barnat, Toh-Ming Lu 
 - Boston  Kluwer Academic  2003 
 - x, 155 p. : ill. ; 24 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9781402075438 
<br/><br/><label>ISSN: </label>2003054987 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Cathode sputtering (Plating process)<br/>Thin films
<br/><br/><label>Dewey Class. No.: </label>621.38152 BAR