TY  - BOOK
AU  - Sturtevant, John L
ED  - International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers
TI  - Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA
SN  - 9780819452894
SN  - 200430319
U1  - 686.2325 STU 
PY  - 2004///
CY  - Bellingham, Wash
PB  - SPIE
KW  - Microlithography - Congresses
KW  - Photoresists - Congresses
N1  - Includes bibliographical references and index
ER  -