Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA 
John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH 
 - Bellingham, Wash  SPIE  c2004 
 - 2 v. (xxxviii, 1288 p.) : ill. ; 28 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780819452894 
<br/><br/><label>ISSN: </label>2004303191 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses<br/>Photoresists - Congresses
<br/><br/><label>Dewey Class. No.: </label>686.2325 STU