TY  - BOOK
AU  - Fedynyshyn, Theodore H
ED  - International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers
TI  - Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA
SN  - 9780819448446
SN  - 200429688
U1  - 621.381531 FED 
PY  - 2003///
CY  - Bellingham, Wash
PB  - SPIE
KW  - Microlithography - Congresses
KW  - Photoresists - Congresses
N1  - Includes bibliographical references and author index
ER  -