Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA 
Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International 
 - Bellingham, Wash  SPIE  c2003 
 - 2 v. : ill. ; 28 cm 
<br/><br/> Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819448446 
<br/><br/><label>ISSN: </label>2004296884 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses<br/>Photoresists - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 FED