Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA 
Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH 
 - Bellingham, Wash  SPIE  c2001 
 - 2 v. (xxix, 1084 p.) : ill. ; 28 cm 
<br/><br/> Includes bibliographical references and author index 
<br/><br/><label>ISBN: </label>9780819440310 
<br/><br/><label>ISSN: </label>2002283519 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses<br/>Photoresists - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 HOU