Houlihan, Francis M <br/><br/>
Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA 
Houlihan, Francis M 
 - Bellingham, WA  SPIE  2000 
 - xvii, 618 p. : ill. ; 29 cm 
<br/><br/> Includes index 
<br/><br/><label>ISBN: </label>9780819436177 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography<br/>Photoresists
<br/><br/><label>Dewey Class. No.: </label>686.2325 HOU