TY  - BOOK
AU  - Martin, Patrick M
AU  - Naber, Robert J
ED  - BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Symposium on Photomask Technology (26th : 2006 : Monterey, Calif.)
TI  - Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA
SN  - 9780819464446
SN  - 200727148
U1  - 621.381531 MAR 
PY  - 2006///
CY  - Bellingham, WA
PB  - SPIE
KW  - Integrated circuits - Masks - Congresses
KW  - Microlithography - Congresses
N1  - Includes bibliographical references and index
ER  -