Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA 
Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering 
 - Bellingham, WA  SPIE  c2006 
 - (various pagings) : ill. (some col.) ; 28 cm 
<br/><br/> Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780819464446 
<br/><br/><label>ISSN: </label>2007271488 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits - Masks - Congresses<br/>Microlithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 MAR